Nano Dry Ice Semiconductor Cleaning Machine

Nano Dry Ice Semiconductor Cleaning Machine

Nano Dry Ice Semiconductor Cleaning Machine

Controlled temperature auxiliary gas, object surface no condensation;
Removal of foreign particles at micro and nano levels;
Micro-nano particles dry ice, small damage to objects;
No waste water, waste liquid generated;
No additional drying process, low power consumption;
Suitable for complex shapes;
Dry ice particle diameter: 0.5-1000 microns adjustable;
Optional online detection, graphical cleaning and other functions.

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